Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-12-28
2000-08-01
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
216 62, G03F 900
Patent
active
060964596
ABSTRACT:
A method of repairing quartz bump defects on an alternating phase shifting template such as a mask or reticle that includes the steps of locating a defect by either SEM scanning or low energy FIB scanning; directing a FIB at the bump defect, and irradiating the bump detect with high energy ions from the FIB. After the bump has been thoroughly stained with ions, the template is exposed to a strongly basic solution to remove the stained bump. Suitable bases include sodium hydroxide, potassium hydroxide, ammonium hydroxide, to tetramethyl ammonium hydroxide, and the like. According to this method, a quartz bump defect is removed with high precision and less damage to the substrate.
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Seiko Instrument, Inc. Scientific Instrument Division, SIR-3000, Photomask Repair System, Operation Manual.
Micro)n Technology, Inc.
Rosasco S.
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