Method for making wavelength-selective phase-type optical low-pa

Details Method for making wavelength-selective phase-type optical low-pa Method for making wavelength-selective phase-type optical low-pa

1996-05-14

1998-02-03

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430326, G03F 900

Patent

active

057142840

ABSTRACT:
A method of forming a wavelength-selective optical low-pass antiliasing filter for use with an optical imaging system of a solid-state color imager or the like is disclosed. The method includes coating a transparent glass wafer with a layer of transparent photopatternable organic polymer material having a thickness that is equal to the thickness of randomly placed transparent low-pass antiliasing filter spots, exposing the transparent photopatternable layer in areas to form a pattern of randomly placed spots in unexposed areas that correspond to the optical low-pass antiliasing filter, and developing the exposed transparent photopatternable layer to remove the exposed regions corresponding to pattern of randomly placed transparent low-pass antiliasing filter spots.

REFERENCES:
patent: 4009939 (1977-03-01), Okano
patent: 4083627 (1978-04-01), Okano
patent: 4480896 (1984-11-01), Kubo et al.
patent: 5585885 (1996-12-01), Muramatsu

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