System for delivering a substantially constant vapor flow to a c

Details System for delivering a substantially constant vapor flow to a c System for delivering a substantially constant vapor flow to a c

1997-07-28

1999-10-12

Walberg, Teresa

Electric resistance heating devices

Heating devices

Vaporizer

118715, 4272551, B01D 700, C23C 1600

Patent

active

059664991

ABSTRACT:
A vapor delivery system for delivering a vapor-phase reactant to a chemical process reactor at a substantially constant flow rate. The vapor delivery system includes a source of a reactant material, means for converting the reactant material to a vapor and for maintaining a predetermined volume of vapor in a vapor phase, a flow controller for providing a controlled flow of the vapor-phase reactant to the process reactor, means for detecting a parameter related to the availability of the vapor-phase reactant material to the process reactor from the flow controller, and means responsive to the detection signal for controlling the supply of reactant material to the vapor converter. In one embodiment the parameter is the pressure of the vapor within the predetermined volume. In another embodiment the parameter is the fluid conductance of a control valve within the flow controller. The vapor delivery system of the present invention can operate in either a substantially continuous or a noncontinuous delivery mode.

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