Positive resist composition

Details Positive resist composition Positive resist composition

1993-05-13

1995-04-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, G03F 7023, G03F 730

Patent

active

054077788

ABSTRACT:
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: ##STR1## wherein R.sub.1 and R.sub.2 each represent hydrogen, halogen, --OCOR.sub.3, alkyl or alkoxy in which R.sub.3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, R.sub.o, R' and R.sub.o ' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.

REFERENCES:
patent: 4529682 (1985-07-01), Toukhy
patent: 4536465 (1985-08-01), Uehara et al.
patent: 4681923 (1987-07-01), Demmer et al.
patent: 4957846 (1990-09-01), Jeffries, III et al.
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5178986 (1993-01-01), Zampini et al.
SPIE vol. 1086 Advances in Resist Technology and Processing VI (1989) pp. 363-373.

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