Method for monitoring and analyzing manufacturing processes usin

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36446815, 364488, G06G 748

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059663120

ABSTRACT:
A statistical simulation of a semiconductor fabrication process is performed in parallel with the actual process. Input parameters derived from a probability density function are applied to the simulator which, in turn, simulates an actual fabrication process which is modeled as a probability density function. Each simulation step is repeated with a random seed value using a Monte Carlo technique, a trial-and-error method using repeated calculations to determine a best solution to a problem. The simulator generates an output in the form of a probability distribution. The statistical simulation uses single-step feedback in which a simulation run uses input parameters that are supplied or derived from actual in-line measured data. Output data generated by the simulator, both intermediate output structure data and WET data, are matched to actual in-line measured data in circumstances for which measured data is available. The probability density structure of the simulator is adjusted after each simulation step so that simulated data more closely matches in-line measured data.

REFERENCES:
patent: 4827395 (1989-05-01), Anders et al.
patent: 4901242 (1990-02-01), Kotan
patent: 5105362 (1992-04-01), Kotani
patent: 5111404 (1992-05-01), Kotani
patent: 5495417 (1996-02-01), Fuduka et al.
patent: 5539652 (1996-07-01), Tegethoff
patent: 5621652 (1997-04-01), Eakin
patent: 5646870 (1997-07-01), Krivokapic et al.
Chee K. Chow, Projection of Circuit Performance Distribution by Multivariate Statistics, May 1989, pp. 60-65, IEEE Transactions on Semiconductor Manuafacturing vol. 2 No. 2.
Schneider et al.: ControlShell--A real-time software framework, IEEE.
Root et al.: Statistical Circuit Simulation With Measurement-Based Active Device Models--Implications For Process Control and IC Manufacturability, IEEE.
Austin: Creating A Mixed-Signal Simulation Capability For Concurrent IC Design and Test Program Development, IEEE.

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