Apparatus for treating the surfaces of wafers

Details Apparatus for treating the surfaces of wafers Apparatus for treating the surfaces of wafers

1988-06-27

1989-10-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

048709239

ABSTRACT:
An apparatus for treating the surface of wafers with a vaporous agent. The apparatus includes an arrangement in which, prior to being discharged, excess vapor stays for a while outside a treating chamber so as to keep the treating vapor and the discharging excess vapor at the same vaporous level. Thus, treating vapor evenly contacts the entire surface of a wafer.

REFERENCES:
patent: 4340462 (1982-06-01), Koch
patent: 4693211 (1987-09-01), Ogami
patent: 4695700 (1987-09-01), Provence
patent: 4767641 (1988-08-01), Kieser

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