Method of treating a substrate material to form an electrode

Chemistry: electrical and wave energy – Processes and products

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204 96, C25D 906

Patent

active

041893573

ABSTRACT:
The present invention relates to an improved method of treating a substrate material selected from the group consisting of titanium, tantalum, zirconium, niobium, hafnium and their alloys to form an electrode. Broadly, the improved method comprises anodically treating the substrate material in an electrolyte containing fluoride ions under controlled potential conditions.

REFERENCES:
patent: 3841978 (1974-10-01), Lai
"Electrodes of Thick Coatings of Pt. & Pd. on Refractory Metals for Aqueous Electrolytes," Cramer et al., Bur. of Mines, R. I., 9/67, p. 50.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of treating a substrate material to form an electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of treating a substrate material to form an electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of treating a substrate material to form an electrode will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-652265

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.