Production of clean HCN-free synthesis gas

Details Production of clean HCN-free synthesis gas Production of clean HCN-free synthesis gas

1978-06-26

1980-02-19

Bashore, S. Leon

Gas: heating and illuminating

Processes

Fuel mixtures

48206, 55 68, 252373, 423236, C10K 110

Patent

active

041893077

ABSTRACT:
Clean HCN-free synthesis gas is produced from raw synthesis gas leaving a partial-oxidation gas generator by a continuous process comprising the steps of partial cooling, scrubbing with condensate, cooling below the dew point by indirect heat exchange preferably with a rich liquid absorbent from a downstream acid-gas-removal zone, and scrubbing with cold aqueous absorbent. The rich HCN-containing aqueous absorbent is then safely processed, without polluting the environment. For example, the HCN-containing aqueous absorbent may be stripped or reacted in the gas generator. Optionally, other acid gases, if present, may be removed from the synthesis gas in said acid-gas-removal zone.

REFERENCES:
patent: 1971779 (1934-08-01), Gollmar
patent: 2088003 (1937-07-01), Sperr, Jr.
patent: 2143821 (1939-01-01), Sperr, Jr.
patent: 2989147 (1961-06-01), Gollmar
patent: 3848057 (1974-11-01), Leder et al.
patent: 3866411 (1975-02-01), Marion et al.
patent: 3878289 (1975-04-01), Beavon
patent: 3887682 (1975-06-01), Kumata et al.
patent: 3935188 (1976-01-01), Karwat
patent: 3950492 (1976-04-01), Haese
patent: 4088735 (1978-05-01), Bratzler et al.

Affiliated with

Also associated with

Rating

Production of clean HCN-free synthesis gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of clean HCN-free synthesis gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of clean HCN-free synthesis gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-651870