Photopolymerizable composition and its use

Details Photopolymerizable composition and its use Photopolymerizable composition and its use

1977-12-08

1979-01-16

Turer, Richard B.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

96115P, 20415915, 20415916, 20415917, 20415918, 20415919, 260837R, 427 54, 428418, 428463, C08F 246, C08F 400, C08F 818

Patent

active

041348133

ABSTRACT:
A photopolymerizable composition which contains one or more olefinically unsaturated compounds and from 0.2 to 20% by weight (based on the unsaturated compound(s)) of a photoinitiator, with or without conventional additives, the photoinitiator being a mixture of one or more aromatic carbonyl compounds of the general formula (A) ##STR1## where Ar is an ortho-arylene radical which may or may not be substituted by one or more radicals R.sup.1 to R.sup.4, R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are identical or different and each is H, alkyl or 1 to 5 carbon atoms, phenyl, halogen, alkoxy of 1 to 5 carbon atoms, alkaryl of 7 to 11 carbon atoms, aralkyl of 7 to 11 carbon atoms or --CO.sub.2 R.sup.9, where R.sup.9 is alkyl of 1 to 5 carbon atoms, and n is 0 or 1, and an amine, with or without an aromatic carbonyl compound which differs from (A).
This photopolymerizable composition is particularly suitable for the manufacture of photopolymer printing plates and UV-curing printing inks.

REFERENCES:
patent: 3759807 (1973-09-01), Osborn et al.
patent: 3787212 (1974-01-01), Heimsch
patent: 3857769 (1974-12-01), McGinniss
patent: 3903322 (1975-09-01), Ravve et al.
patent: 3966573 (1976-06-01), Bean

Affiliated with

Also associated with

Rating

Photopolymerizable composition and its use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable composition and its use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition and its use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-650482