Method of manufacturing a semiconductor memory having an increas

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 35, 437 38, 437 47, 437 60, H01L 2170

Patent

active

053345479

ABSTRACT:
A semiconductor memory includes at least one memory cell composed of an insulated gate field effect transistor and an associated stacked capacitor which are formed close to each other on a single substrate of a first conduction type. The insulated gate field effect transistor has a source and a drain which are located separately from each other in the single substrate and formed of impurity regions of a second conduction type opposite to the first conduction type. The insulated gate field effect transistor also has a gate formed through a gate insulator on a region between the source and the drain. The gate and the source of the insulated gate field effect transistor are connected to a word line and a bit line, respectively, and the drain of the insulated gate field effect transistor is connected to a first electrode of the stacked capacitor. The memory cell also comprises a first impurity region of the first conduction type formed in the substrate below the stacked capacitor, and a second impurity region of the second conduction type which is formed above the first impurity region in the substrate below the stacked capacitor and which has a junction depth shallower than the depth of the first impurity region, so that a pn junction is formed between the first impurity region and the second impurity region. The second impurity region is connected to the first electrode of the stacked capacitor. With this arrangement, the memory cell has a cell capacitance of based on a sum of a capacitance of the stacked capacitor and a junction capacitance of the pn junction.

REFERENCES:
patent: 4355374 (1982-10-01), Sakai et al.
patent: 4742018 (1988-05-01), Kimura et al.
patent: 4745454 (1988-05-01), Erb
patent: 4794563 (1988-12-01), Maeda
patent: 4845544 (1989-07-01), Shimizu
patent: 4888628 (1989-12-01), Bergemont
patent: 5013673 (1991-05-01), Fuse
patent: 5047359 (1991-10-01), Nagatomo

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing a semiconductor memory having an increas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing a semiconductor memory having an increas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing a semiconductor memory having an increas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-64735

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.