Process for the preparation of high chloride tabular grain emuls

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing

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430567, 430615, G03C 1035, G03C 107

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active

051837323

ABSTRACT:
A process of preparing a radiation sensitive high chloride high aspect ratio tabular grain emulsion is disclosed wherein silver ion is introduced into a gelatino-peptizer dispersing medium containing a stoichiometric excess of chloride ions with respect to the silver ions further characterized by a chloride ion concentration of less than 0.5 molar, a pH of at least 4.6, and a grain growth modifier of the formula: ##STR1## where N.sup.4 is an amino moiety and

REFERENCES:
patent: 4399215 (1983-08-01), Wey
patent: 4400463 (1983-08-01), Maskasky
patent: 4414306 (1983-11-01), Wey et al.
patent: 4713323 (1987-12-01), Maskasky
patent: 4783398 (1988-11-01), Takada et al.
patent: 4804621 (1989-02-01), Tufano et al.
patent: 4942120 (1990-07-01), King et al.
patent: 4952491 (1990-08-01), Nishikawa et al.
patent: 4983508 (1991-01-01), Ishiguro et al.

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