Process for producing a thin alloy film having high saturation m

Chemistry: electrical and wave energy – Processes and products

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204 445, C25D 356

Patent

active

050115812

ABSTRACT:
A ternary FeCoNi alloy film exhibiting a high magnetic flux density is produced by performing electrodeposition at a cathodic electrode using an electrolytic bath for electrodeposition fed with Fe, Co and Ni ions from sulfates, hydrochlorides or mixtures thereof containing respective divalent ions of Fe, Co and Ni, said bath containing a composition having ratios of divalent ion concentrations in the bath in the ranges:

REFERENCES:
patent: 3297418 (1967-01-01), Firestone et al.
patent: 3533922 (1970-10-01), Semienko et al.
patent: 3592746 (1971-07-01), Hespenheide
patent: 3597335 (1971-08-01), Humpage et al.
patent: 4014759 (1977-03-01), McMullen et al.
patent: 4046647 (1977-09-01), Harbulak
patent: 4053373 (1977-10-01), McMullen et al.
patent: 4214954 (1980-07-01), Kuo
patent: 4661216 (1987-04-01), Anderson et al.
R. Sivakumar et al., Metal Finishing, pp. 66 and 74, Apr. 1969.
Abner Brenner, Electrodeposition of Alloys, vol. II, pp. 242-246, (1963).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing a thin alloy film having high saturation m does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing a thin alloy film having high saturation m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing a thin alloy film having high saturation m will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-638828

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.