Coating apparatus – Gas or vapor deposition – With treating means
Patent
1985-03-07
1986-10-07
Morgenstern, Norman
Coating apparatus
Gas or vapor deposition
With treating means
118730, 118 501, C23C 1308
Patent
active
046152997
ABSTRACT:
A plasma CVD (chemical vapor deposition) apparatus of the capacitance coupling type for effecting the chemical vapor deposition on a drum which includes an air tight chamber made of an electrically conductive material, a support provided in the chamber for supporting the drum inside the chamber in an electrically insulated relationship with the chamber, and an RF power source for supplying RF power to the drum. The chamber is grounded and, therefore, the plasma is generated between the drum and inside wall of the chamber. The apparatus is provided with means for providing a smooth surface on the drum. The drum can be used as a photoreceptor for use in an electrophotographic copying machine.
REFERENCES:
patent: 4466380 (1984-08-01), Jansen et al.
patent: 4480010 (1984-10-01), Sasanuma et al.
Ehara Shaw
Hayakawa Takashi
Kojima Yoshimi
Matsuyama Toshiro
Narikawa Shiro
Jaconetty K.
Morgenstern Norman
Sharp Kabushiki Kaisha
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