Method for producing a substrate having crystalline silicon nucl

Details Method for producing a substrate having crystalline silicon nucl Method for producing a substrate having crystalline silicon nucl

1996-02-12

1998-04-14

Bowers, Jr., Charles L.

Fishing, trapping, and vermin destroying

437174, 437233, 437967, 437937, 117 8, 117904, 148DIG93, H01L 21268

Patent

active

057390436

ABSTRACT:
A method for producing a substrate for forming a polysilicon thin film by forming an amorphous silicon film of a thickness not more than 200 .ANG., irradiating excimer laser light onto the amorphous silicon film to crystallize silicon particles contained in the amorphous silicon film; and irradiating the amorphous silicon film with hydrogen radicals to etch the amorphous silicon film.

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