Photopolymerizable mixture and photopolymerizable copying materi

Details Photopolymerizable mixture and photopolymerizable copying materi Photopolymerizable mixture and photopolymerizable copying materi

1983-06-14

1985-07-23

Lieberman, Allan M.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415915, 20415923, 525 57, 525277, C08J 328, C08L 3302, C08L 3304, C08L 6900

Patent

active

045307474

ABSTRACT:
Disclosed are a photopolymerizable mixture and photopolymerizable copy materials made therefrom. The mixture contains a polymerizable compound having terminal acrylic or methacrylic acid ester groups, selected from a compound of one of the general formulas ##STR1## wherein R.sub.1 is a phenylene group or a biphenyldiyl group or a group formed by two phenylene groups which are linked by a bridge comprising an oxygen atom, a sulphur atom, a sulfone group, a substituted or unsubstituted alkylene group or cycloalkylene group, or a group of the formula --(O-alkylene).sub.n O-- with n=1-3,

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patent: 4427823 (1984-01-01), Inagaki et al.

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