Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1983-05-20
1985-07-23
Bleutge, John C.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
20415915, 20415917, 20415919, 526266, 526270, C08F 250
Patent
active
045307466
ABSTRACT:
A photosensitive resin composition comprising (a) 10 to 90 parts by weight of at least one polymerizable monomer of the formula: ##STR1## (R is defined in the specification), (b) 90 to 10 parts by weight of at least one compound selected from the group consisting of epoxy-acrylate resins, 1,2-polybutadiene resins, polyester resins and organopolysiloxanes, all having one or more acryloyloxy or methacryloyloxy groups in their molecular end or ends, and (c) 0.05 to 5 parts by weight of a photosensitizer based on 100 parts by weight of the sum of the components (a) and (b) shows slight shrinkage and the resulting coating film is good in adhesive properties and mechanical strength.
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patent: 4332731 (1982-06-01), Endo et al.
patent: 4358354 (1982-11-01), Iida et al.
patent: 4396476 (1983-08-01), Roemer et al.
Bailey, "Synthesis and Free Radical Ring-Opening Polymerization . . . ", Macromolecular Chem. 183, 1913-1920, (1982).
Cho, "Exploratory Ring-Opening Polymerization . . . " Journal of Polymer Science: Polymer Letters Ed., vol. 20, 361-364, (1982).
Bailey, "Free Radical Ring-Opening Polymerization . . . " Macromolecules, vol. 15, pp. 711-714, 1982.
Azuma Kazufumi
Endo Takeshi
Nakatani Mitsuo
Nate Kazuo
Yokono Hitoshi
Bleutge John C.
Hitachi , Ltd.
Koeckert A. H.
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