Method of fabricating semiconductor device

Fishing – trapping – and vermin destroying

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437195, 437229, 437233, 437913, H01L 218234, H01L 21441

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active

055125000

ABSTRACT:
A method of fabricating a semiconductor device forms a resist pattern for a gate electrode or the like on a semiconductor device in such a manner that only a fine resist pattern is formed on a resist member by an electron beam lithography and other resist patterns are formed on the same resist member by an optical lithography.

REFERENCES:
patent: 4898804 (1990-02-01), Rauschenbach et al.
patent: 4935377 (1990-06-01), Strifler et al.
patent: 4997780 (1991-03-01), Szluk et al.
patent: 5037772 (1991-08-01), McDonald
patent: 5110763 (1992-05-01), Matsumoto

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