Method for forming deposited film

Details Method for forming deposited film Method for forming deposited film

1987-03-30

1989-10-31

Morgenstern, Norman

Coating processes

Coating by vapor, gas, or smoke

427255, 4272551, 4272552, 4272553, 4272554, 4272557, C23C 1600

Patent

active

048776505

ABSTRACT:
A method for forming a deposited film comprises effecting a step (a) and a step (b) at least one time, the step (a) being introduction of a starting material (A) which is either one of a gaseous starting material for formation of a deposited film or a gaseous halogenic oxidizing agent having the property of oxidative action on said gaseous starting material into a film forming space in which a substrate for film formation is arranged to have said starting material (A) adsorbed onto the surface of said substrate to form an adsorbed layer (I) and the step (b) being the introduction of a starting material (B) which is the other of said gaseous starting material and said gaseous halogenic oxidizing agent into said film forming space, thereby causing surface reaction on said adsorbed layer (I) to occur to form a deposited film (i).

REFERENCES:
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4568626 (1986-02-01), Ogawa
patent: 4657777 (1987-04-01), Hirooka et al.

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