Chemical dehydroxylation of silica

Details Chemical dehydroxylation of silica Chemical dehydroxylation of silica

1981-08-28

1982-11-02

Levin, Stanford M.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

252452, 252458, 423347, 526 98, 526352, C08F 402, C08F 424

Patent

active

043574513

ABSTRACT:
Silica having an enhanced level of dehydration beyond what can be produced by heating alone is produced by a three step process comprising (1) chlorination, (2) dechlorination, and (c) oxidation. The resulting dehydroxylated silica is a novel composition of matter and is useful as a reinforcing agent in rubber or plastics and as a support for a chromatographic column in addition to being suitable for a catalyst support. Where the dechlorinating agent is hydrogen, a hydrophobic silica composition containing.tbd.Si-H structures and essentially no -OH groups is produced which is suitable for use as a reducing agent, a coupling agent as well as a precursor for the oxidized dehydroxylated silica described above. The resulting composition is particularly suitable as a support for chromium-containing olefin polymerization catalysts.

REFERENCES:
patent: 3007905 (1961-11-01), Bailey
patent: 3041144 (1962-06-01), Schering
patent: 3280096 (1966-10-01), Mackenzie
patent: 3629150 (1971-12-01), Addy
patent: 3892678 (1975-07-01), Halasz et al.
patent: 3997465 (1976-12-01), Grossman et al.
patent: 4248735 (1981-02-01), McDaniel et al.
Modified Silica Gels as Adsorbents and Catalysts, Burwell, Jr., Chemtech, Jun. 1974, pp. 370-377.

Affiliated with

Also associated with

Rating

Chemical dehydroxylation of silica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical dehydroxylation of silica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical dehydroxylation of silica will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-624783