Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1988-06-22
1989-10-31
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20419212, 20419215, 204298, C23C 1434
Patent
active
048775053
ABSTRACT:
In order to obtain coatings of greater density and compactness than were possible until now when coating substrates with magnetic field-supported cathode sputtering, a given fraction of metal vapor obtained by vaporization of an electric arc discharge from the anode or cathode is deposited on the functional areas of the substrates together with the sputtered material and, specifically, at least 5 atom percent of the total metal fraction of the coating to be deposited averaged over time is applied by vaporization of an electric arc discharge. A suitable vacuum coating installation for carrying out the method has within a vacuum chamber, a device for vaporizing a part of the coating-forming material with an electric arc discharge and an additional device for magnetic field-supported sputtering of another part of the coating-forming material.
REFERENCES:
patent: 4294678 (1981-10-01), Kuehnle
patent: 4346123 (1982-08-01), Kaufman
patent: 4492845 (1985-01-01), Kljuchko et al.
patent: 4619748 (1986-10-01), Moll et al.
patent: 4655893 (1987-04-01), Beale
patent: 4740385 (1988-04-01), Feuerstein et al.
Balzers Aktiengesellschaft
Nguyen Nam X.
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