Fishing – trapping – and vermin destroying
Patent
1990-04-18
1991-03-26
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437229, 437924, 437984, 437195, H01L 21311
Patent
active
050029029
ABSTRACT:
A method for fabricating a semiconductor device comprises the steps of providing a first insulator layer on the top surface of a substrate so as to cover a first surface region defined on the top surface of the substrate; providing a second insulator layer on the substrate so as to cover a second surface region defined on the top surface of the substrate such that the second insulator layer further covers the first insulator layer, forming a first hole acting as an alignment mark and a second hole acting as a contact hole throughout the second insulator layer respectively in correspondence to the first surface region and the second surface region simultaneously by an etching process applied to the second insulator layer. The etching process is performed such that the etching proceeds into the first insulator layer with a first etching rate when forming the first hole and such that the etching proceeds into the substrate with a second etching rate smaller than the first etching rate when forming the second hole, and thereby the first hole penetrates into the first layer at least for a first depth and the second hole penetrates into the substrate for a second depth which is smaller than the first depth. Further a conductor material is deposited on the second insulator layer including a part of the second insulator layer corresponding to the first surface region and another part of the second insulator layer corresponding to the second surface region to form a conductor layer such that the second hole is filled by the conductor material with a substantially flat top surface being formed at a part of the conductor layer covering the second hole while the first hole is filled only partially.
REFERENCES:
patent: 3783044 (1974-01-01), Cheskis et al.
patent: 4442590 (1984-04-01), Stockton et al.
patent: 4487653 (1984-12-01), Hatcher
patent: 4732646 (1988-03-01), Elsner et al.
Chaudhuri Olik
Fujitsu Limited
Holtzman Laura M.
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