Method of controlling the chemical structure of polymeric films

Details Method of controlling the chemical structure of polymeric films Method of controlling the chemical structure of polymeric films

1989-08-31

1991-03-26

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 40, 427 39, 427 38, B05D 306

Patent

active

050027948

ABSTRACT:
A method of controlling the chemical structure of thin films formed by plasma deposition and films produced by these methods, is disclosed. An important aspect of the method involves controlling the temperature of the substrate and the reactor so as to create a temperature differential between the substrate and reactor such that the precursor molecules are preferentially adsorbed or condensed onto the substrate either during plasma deposition or between plasma deposition steps. The thin films produced by the methods of this invention exhibit more defined and predictable chemical structures and properties than conventional plasma deposited films.

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