Photomask and method of fabrication thereof

Details Photomask and method of fabrication thereof Photomask and method of fabrication thereof

1985-10-25

1987-06-02

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 427 38, 428704, G03F 900

Patent

active

046703659

ABSTRACT:
A photolithographic mask for use in the fabrication of semiconductor integrated circuit devices, comprising a transparent substrate having a major surface, and a metallic film formed on the major surface of the transparent substrate and impermeable to ultraviolet rays having wavelengths within a predetermined range, wherein the metallic film is doped with sulfur ions to provide a reduced angle of contact between the surface of the film and a body of pure water to achieve an increased degree of adaptability of the photomask to cleaning with pure water when the photomask is put to repeated use over a prolonged period of time.

REFERENCES:
Long et al, "The Boriding of Chromium Photomask . . . ", Thin Solid Films, 64 (3), 1979, pp. 433-438.
Wilson et al, Ion Beams with Applications to Ion Implantation, John Wiley & Sons, New York, 1973.

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