Integrated circuit device including both N-channel and P-channel

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 23, 357 52, 357 89, H01L 2702, H01L 2978, H01L 2934

Patent

active

042400937

ABSTRACT:
A complementary MOS integrated circuit device, adapted for fabrication with relatively high circuit density, includes relatively fast transistors with a closed gate geometry. Permanently-off gates surround transistors to isolate them from other transistors.
A method of making this structure involves self-aligned gate techniques in which the sources and drains are defined as regions which surround the gates and are surrounded by the gates, respectively.

REFERENCES:
patent: 3315096 (1967-04-01), Carlson et al.
patent: 3608189 (1971-09-01), Gray
patent: 3712995 (1973-01-01), Steudel
patent: 3786319 (1974-01-01), Tomisaburo
patent: 3806371 (1974-04-01), Barone
patent: 3868721 (1975-02-01), Davidsohn
patent: 3886583 (1975-05-01), Wang
RCA COS/MOS Integrated Circuits Manual, (3/71), p. 24-26, RCA, Somerville, N.J.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Integrated circuit device including both N-channel and P-channel does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated circuit device including both N-channel and P-channel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated circuit device including both N-channel and P-channel will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-611004

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.