Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1987-08-21

1988-07-19

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, 356401, G03B 2752, G03B 2770

Patent

active

047588640

ABSTRACT:
A projection exposure apparatus on which are placed a reticle whose pattern is comprised of an area transmitting a radiation therethrough and an area not transmitting the radiation therethrough and a substrate includes a projection optical system for projecting the pattern formed on the reticle onto the substrate, the projection optical system being telecentric on the substrate side, a device producing a radiation beam for alignment of the reticle and the substrate, an alignment device for supplying the radiation beam onto the substrate through the reticle and the projection optical system and detecting the relative positional relation between the reticle and the substrate through the projection optical system, a device for imparting displacement to the projection optical system to the position of incidence of the radiation beam onto the projection optical system by the alignment device, a device for outputting a position signal conforming to the relative position of the optic axis of the projection optical system and the position of incidence, and a deflecting device responsive to the position signal to deflect the angle of the principal ray of the radiation beam entering the projection optical system so that the telecentricity of the projection optical system on the substrate side is maintained.

REFERENCES:
patent: 4492459 (1985-01-01), Omata
patent: 4508749 (1985-04-01), Brannon et al.
patent: 4620785 (1986-11-01), Suzuki et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4655601 (1987-04-01), Suzuki
patent: 4657379 (1987-04-01), Suwa
patent: 4669867 (1987-06-01), Uda et al.
patent: 4690529 (1987-09-01), Sugiyama et al.
patent: 4711567 (1987-12-01), Tanimoto

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