Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1976-04-14
1977-12-20
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, 428421, C23C 1500
Patent
active
040640302
ABSTRACT:
The surface of a molded article of a fluorine resin is treated to provide better adhesion by sputter etching it in an atmosphere whose pressure is maintained at about 0.0005 to about 0.5 Torr.
REFERENCES:
patent: 3617354 (1971-11-01), Carnahan et al.
C. Weissmantel et al., "Interaction of Ion Beams with Polymer Surfaces Leading to Etching and Sputtering Processes," Japan J. Appl. Phys. Suppl. 2, Pt. 1, (1974), pp. 439-442.
M. Rost et al., "Ion-Beam Etching and Sputtering of Polytetrafluoroethylene (PTFE)", Thin Solid Films, 20, 515-519 (1974).
D. T. Morrison et al., "RF Sputtering of Plastics", Thin Solid Films, vol. 15, pp. 87-101 (1973).
A. I. Akishin et al., "The Atomisation of Polymers by Argon, Helium, and Hydrogen Ions with Energies Up to 30 KeV", Russian J. Phys. Chem., vol. 39, No. 12, Dec. 1965, p. 1637.
M. Rost et al., "Ion-Beam Etching and Sputtering of Polytetrafluoroethylene", Chem. Abstr. 81, 78356n (1974).
Fukunaga Kazuo
Nakai Junkichi
Kaplan G. L.
Nitto Electric Industrial Co. Ltd.
Weisstuch Aaron
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