Photosensitive composition comprising a polymer having a 4-hydro

Details Photosensitive composition comprising a polymer having a 4-hydro Photosensitive composition comprising a polymer having a 4-hydro

1994-10-04

1995-10-17

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430176, 430281, 430288, 430302, 430906, 430910, G03F 7021, G03F 7033

Patent

active

054590108

ABSTRACT:
A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol % of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.

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Patent Abstracts of Japan, vol. 11, No. 253, (P-606)(2700), Aug. 18, 1987, & JP-A-62-59948, Mar. 16, 1987, Y. Maeda, et al., "Photosensitive Composition".

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