Exposure method for forming sloping sidewalls in photoresists

Details Exposure method for forming sloping sidewalls in photoresists Exposure method for forming sloping sidewalls in photoresists

1994-12-06

1995-10-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 430322, 430323, 430326, 430394, 430396, 430397, G03F 900

Patent

active

054590035

ABSTRACT:
A method of forming side surfaces of photosensitive material removed areas is performed so that the side surfaces are inclined to the surface of a substrate when transferring a pattern formed on a mask onto the substrate coated with a photosensitive material and effecting a developing process on the substrate. An image of the pattern to be transferred onto the substrate and the substrate are relatively shifted in a direction along the surface of the substrate during the transfer.

REFERENCES:
patent: 4935334 (1990-06-01), Boettiger et al.

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