Process of cleaning a substrate and apparatus for cleaning a sub

Details Process of cleaning a substrate and apparatus for cleaning a sub Process of cleaning a substrate and apparatus for cleaning a sub

1994-12-15

1997-07-01

Kastler, Scott

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 26, 134 30, B08B 312

Patent

active

056433689

ABSTRACT:
A method for cleaning an object involves the steps of treating an object by dipping the object in a cleaning liquid, rinsing the object with a rinse liquid having a first lower temperature for removing dust particles from the object, and rinsing the object subsequently using a rinse liquid having a second, higher temperature, for removing the cleaning liquid, wherein the first temperature is set such that no icing occurs on the dust particles.

REFERENCES:
patent: 3066050 (1962-11-01), Garton, Jr.
patent: 3076730 (1963-02-01), Nolte
patent: 4997490 (1991-03-01), Vetter et al.
patent: 5346556 (1994-09-01), Perry et al.
patent: 5372651 (1994-12-01), Kodama

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