Methods of fabricating a photomask

Details Methods of fabricating a photomask Methods of fabricating a photomask

1982-09-17

1983-09-20

Hess, Bruce H.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

156 99, 156107, 156145, 427164, 427165, 427287, 428203, 428209, 428210, 430396, B32B 3100, G03C 506, G03F 900

Patent

active

044057016

ABSTRACT:
A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.

REFERENCES:
patent: 1985074 (1934-12-01), Bauersfeld
patent: 2175343 (1939-10-01), Cunningham
patent: 2317550 (1943-04-01), Ormond
patent: 3193840 (1965-07-01), Mercer
patent: 3400995 (1968-09-01), Borberg et al.
patent: 3906133 (1975-09-01), Flutie
patent: 4201581 (1980-05-01), Thomas et al.
patent: 4256787 (1981-03-01), Shaver et al.

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