Process for producing photoconductive member

Details Process for producing photoconductive member Process for producing photoconductive member

1981-10-09

1983-09-20

Hoffman, James R.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 74, H01L 4500

Patent

active

044056567

ABSTRACT:
A process for producing photoconductive members comprises evacuating a deposition chamber possible to evacuate, to a prescribed degree of vacuum; introducing silicon hydride compound gas, halogen-containing silicon compound gas, and diluent gas in a volume flow ratio of 4-30:2-60:36-81, respectively, into said deposition chamber; forming a gas plasmic atmosphere by generating glow discharge in said surrounding gas mixture; thereby forming, on the surface of a support, for producing the photoconductive member, which has been arranged previously in said deposition chamber, a photoconductive layer constructed of an amorphous material comprising silicon atoms as matrix.

REFERENCES:
patent: 4064521 (1977-12-01), Carlson
patent: 4196438 (1980-04-01), Carlson
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4265991 (1981-05-01), Hirai et al.

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