Method of projecting printing on semiconductor substrate and wor

Details Method of projecting printing on semiconductor substrate and wor Method of projecting printing on semiconductor substrate and wor

1981-05-20

1983-09-20

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Methods

355 44, 355 53, 355125, G03B 2732

Patent

active

044052294

ABSTRACT:
In the projection-copying of a mask on a workpiece including a light-reflecting semiconductor substrate, the alignment of mask and workpiece is effected by illuminating marks on the substrate which appear dark relative to a surrounding area. To provide each mark with a contrasting background of sufficient brightness, a partly reflecting surface layer overlying the substrate in that area has a nonuniform optical thickness whereby cancellation of reflections due to interference is limited to isolated regions.

REFERENCES:
patent: 3771872 (1973-11-01), Nightingale et al.
patent: 3816223 (1974-06-01), Ahn et al.

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