Fishing – trapping – and vermin destroying
Patent
1987-12-10
1989-11-28
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437250, 437946, H01L 2314
Patent
active
048837750
ABSTRACT:
A process for the production of semiconductor devices which comprises washing a cleaned semiconductor substrate with or without one or more component parts formed thereon, with pure water, freezing the pure water containing the washed substrate, preserving and/or transporting the ice-covered substrate, and thawing and drying the substrate before a subsequent process. The production process of the present invention can completely remove contamination on a surface of the semiconductor substrate in a wafer process and can stop the formation of a natural oxide coating on a surface of the substrate: Thus shortening and simplifying the wafer process, increasing the quality and yield of the semiconductor devices, and enabling the cleaned substrate to be preserved for a long period and transported to distant areas or far countries.
REFERENCES:
patent: 2930722 (1960-03-01), Ligenza
patent: 3103733 (1963-09-01), Favro et al.
patent: 3464104 (1969-09-01), Tonner et al.
patent: 3577286 (1971-05-01), Berkenblit et al.
Aspnes et al., Appl. Phys. Lett., V. 46, No. 11, (Jun. 1985), pp. 1071-1073.
IBM Tech. Disc. Bull., V. 27, No. 10A, (Mar. 1985), pp. 5602-5603.
Chaudhuri Olik
Fujitsu Limited
LandOfFree
Process for cleaning and protecting semiconductor substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for cleaning and protecting semiconductor substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for cleaning and protecting semiconductor substrates will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-581790