Method of plating metallo-gallium films

Details Method of plating metallo-gallium films Method of plating metallo-gallium films

1988-08-26

1989-11-28

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

204 61, 204 64R, 204 67, 204 71, C25D 366

Patent

active

048835676

ABSTRACT:
Electrocodeposition of uncontaminated metallo-gallium films (e.g., Ga-As) from a melt consisting essentially of GaCl.sub.3 -dialkylimidazolium chloride and a salt of the metal to be codeposited with the gallium wherein (1) the alkyl groups comprise no more than four carbons, (2) the molar ratio of the dialkylimidazolium chloride to the GaCl.sub.3 is at least 1 but less than about 20, and (3) the molar ratio of the metal salt to the GaCl.sub.3 is less than 0.5.

REFERENCES:
Wicelinski et al, Low Temperature Chlorogallate Molten Salt Systems, JECS, 134 (1987) 262, published in Jan. 1987.
Wicelinski et al, GaAs Film Formation from Low Temperature Chloroaluminate Melts, Proc. 5th Int. Symp. on Molten Salts, vols. 86-1, the Electrochemical Society, 1986, p. 144.

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