Semiconductor device having contacting but electrically isolated

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357 41, 357 42, 357 59, 357 65, 357 68, 357 80, 357 23, H01L 2712, H01L 2978, H01L 2702, H01L 2348

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active

044918569

ABSTRACT:
A semiconductor device includes p- and n-type semiconductor layers formed on an insulating substrate and an n-type interconnection layer formed to be electrically coupled with said n-type semiconductor layer. The n-type interconnection layer is formed in contact with the p-type semiconductor layer and is set at such a potential as to apply a reverse voltage across the p-n junction between the n-type interconnection layer and p-type semiconductor layer, so as to electrically isolate the n-type interconnection layer from the p-type semiconductor layer.

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MOS-Technologien, Gerlach, Funkschau, 1975, No. 25, pp. 58-62.
Nikkei Electronics, 1979, 7.23, pp. 110-132, and partial translation of p. 126.

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