Final polishing composition

Details Final polishing composition Final polishing composition

1993-07-26

1994-10-04

Group, Karl

Compositions: coating or plastic

Coating or plastic compositions

Polishes

106 3, 106 5, 106208, 106209, 10628711, 10628713, 10628714, 10628734, 106491, 51298, 51308, 51309, C09G 102, C09G 116

Patent

active

053522770

ABSTRACT:
A final polishing composition for polishing a silicon wafer used as a substrate crystal in electrical integrated circuits comprises water, colloidal silica, a water-soluble polymeric compound, and a water-soluble salt.

REFERENCES:
patent: 4260396 (1981-04-01), Glemza
patent: 4664679 (1987-05-01), Kohyama et al.
patent: 5226930 (1993-07-01), Sasaki

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