Photomask and method of manufacturing a photomask

Details Photomask and method of manufacturing a photomask Photomask and method of manufacturing a photomask

1990-10-10

1994-03-01

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, G03F 900

Patent

active

052906477

ABSTRACT:
A photomask includes a transparent substrate, a predetermined pattern of a light blocking member disposed on the transparent substrate, and a phase member formed along a peripheral edge of the light blocking member and exposed by a predetermined width. The photomask manufacturing method includes forming a transparent film on a surface of a transparent substrate, forming a predetermined pattern of a light blocking member on the transparent film, forming an etching mask layer on the transparent film and light blocking member, anisotropically etching the etching mask layer to leave the etching mask layer on the transparent film and along a peripheral edge of the light blocking member, and selectively etching the transparent film with the light blocking member and the remaining etching mask layer as a mask to form a phase member of the transparent film along the peripheral edge of the light blocking member.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
Levenson et al., "Improving Resolution In Photolithography With A Phase-Shifting Mask", Dec. 1982, pp. 1828-1836.

Affiliated with

Also associated with

Rating

Photomask and method of manufacturing a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and method of manufacturing a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and method of manufacturing a photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-575949