Apparatus for coating a photo-resist film and/or developing it a

Details Apparatus for coating a photo-resist film and/or developing it a Apparatus for coating a photo-resist film and/or developing it a

1989-02-10

1991-01-15

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354325, 134 66, 134 79, 134902, 414416, 414225, G03D 504, B65G 2500

Patent

active

049857223

ABSTRACT:
An apparatus is disclosed which forms a photo-resist film on a substrate surface and/or develops it. A passage provided such that it extends in a predetermined direction to allow conveying of a substrate having a surface on which a photoresist film is to be formed or a substrate having a photo-resist film to be developed, a plurality of treating units necessary for forming a photo-resist film and/or a plurality of treating units necessary for developing the photo-resist film, these units being provided along the passage, conveying means movable along a predetermined course for conveying the substrate in a predetermined direction, substrate handling means provided on the conveying means for holding a substrate and for setting a substrate into the treating unit, said substrate handling means being movable and rotatable in any direction, and control means for selecting said plurality of treating units in any combination and for controlling operations of the conveying means and substrate handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.

REFERENCES:
patent: 4764076 (1988-08-01), Layman et al.
patent: 4917556 (1990-04-01), Stark

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