Method of manufacturing multi-layered wiring substrate

Metal working – Method of mechanical manufacture – Electrical device making

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29852, 29846, 156644, 156656, 1566591, 1566611, 156901, 156902, 427 96, 427 97, 427125, 427259, 427264, 427265, 427331, 427404, 174 685, H05K 306, H05K 328, H05K 346

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048828394

ABSTRACT:
According to a method of manufacturing a multi-layered wiring substrate, a palladium thin film is formed on an entire surface of a substrate including a conductor wiring layer. A portion except for a predetermined via formation portion on the palladium thin film is masked by a first photoresist. A polyimide-based conductive resin is embedded in the via formation portion through the first photoresist. The first photoresist is removed. The conductor wiring layer and the via formation portion are masked by a second photoresist. The exposed palladium thin film is etched. The second photoresist is removed. The conductive resin is cured. A photosensitive polyimide resin is applied to an entire surface of the substrate, a via-hole is formed in the via formation portion, and the photosensitive polyimide resin is cured.

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