Stage mechanism in exposure apparatus

Details Stage mechanism in exposure apparatus Stage mechanism in exposure apparatus

1996-03-25

1996-11-12

Pham, Hoa Q.

Optics: measuring and testing

Sample, specimen, or standard holder or support

356399, 356363, 318653, 318687, 318640, G01N 2101, G01B 1127, G05B 106

Patent

active

055745563

ABSTRACT:
A stage mechanism suitable used in an exposure apparatus is disclosed, wherein heat generation of a coil assembly of a stage driving motor is prevented from adversely affecting a semiconductor substrate or measurement by a laser interferometer. A wafer chuck and the laser interferometer are disposed at a side of a base plate, and a stage and an electromagnetic coil for dirving the stage are disposed at the other side of the base plate. The wafer chuck and the stage are coupled to each other by a coupling member which extends through a bore formed in the base plate.

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"Electronic Material", Mar. 1990, pages 67 through 72.

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