Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1982-02-18
1983-04-05
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192R, 204192SP, 204192D, 204298, C23C 1500
Patent
active
043790402
ABSTRACT:
A method and apparatus for the control of reactive sputtering deposition of oxide-containing films, including the monitoring of and maintaining the constancy of the deposition rate and total pressure of the system by adjustment of the oxygen and argon input flow rates. Deposition rate is monitored by an activated quartz crystal, and behave as a sensitive function of actual oxygen partial pressure. Stoichiometry, optical and electrical properties of the oxide-containing films are therefore controllable by maintaining constant oxygen partial pressure.
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Demers Arthur P.
PPG Industries Inc.
Seidel Donna L.
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