Mask used in charged particle beam projecting apparatus

Details Mask used in charged particle beam projecting apparatus Mask used in charged particle beam projecting apparatus

1999-05-26

2000-01-18

Young, Christopher G

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

060156430

ABSTRACT:
A method for dividing a pattern according to the present invention is used in a charged particle beam projecting apparatus, in which: a plurality of block patterns into which a projected pattern to be projected on a substrate is divided are respectively formed in a plurality of regions of a mask; the plurality of regions of the mask are successively irradiated with a charged particle beam so that the block patterns are successively projected on the substrate; and as a result the projected pattern is formed on the substrate. The method includes a step of dividing the projected pattern into the block patterns by parting lines which are plotted in accordance with profiles of pattern elements that constitute the projected pattern when the block patterns are determined.

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patent: 5432714 (1995-07-01), Chung et al.
patent: 5528048 (1996-06-01), Oae et al.
patent: 5773171 (1998-06-01), Lee et al.
patent: 5897978 (1999-04-01), Nakajima

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