Exposure method and exposure apparatus

Details Exposure method and exposure apparatus Exposure method and exposure apparatus

1995-03-15

1996-11-12

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430397, 2504911, 2504921, G03F 900

Patent

active

055738770

ABSTRACT:
An exposure method for irradiating a mask from above the mask held in proximity to a substrate positioned below the mask to transfer a mask pattern of the mask to a photosensitive layer of the substrate by exposing the photosensitive layer to a light beam, includes the steps of using a gap-measuring device to measure a gap between a portion of the mask to be locally scanned and irradiated and a portion of the substrate to be locally irradiated, comparing a value measured by the gap-measuring device with a preset value, and locally deforming the mask and/or the substrate according to a difference between the value measured by the gap-measuring device and the preset value so as to cause the gap to approach a predetermined value.

REFERENCES:
patent: 4475223 (1984-10-01), Taniguchi et al.

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