Low temperature method for phosphor screen formation

Details Low temperature method for phosphor screen formation Low temperature method for phosphor screen formation

1998-03-16

2000-01-18

Beck, Shrive

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 72, 427156, 427157, 427226, 427227, 427240, 427356, B05D 506

Patent

active

060155876

ABSTRACT:
A process for manufacturing a phosphorescent screen for use in a cathode ray or field emission display, is described. The phosphor layer is applied in the form of a slurry consisting of a powdered phosphor, an ethylene glycol monobutyl ether acetate solvent, and a cellulose acetate butyrate binder. The phosphor concentration is between 30 and 60% by weight, the solvent between 5 and 52.5% and the binder between 17.5 and 35%. If the slurry composition falls within these ranges, then, once the aluminum anode layer is in place, all organic material can be removed by firing at a temperature that is less than 500.degree. C. By keeping the firing temperature below 500.degree. C., roughening of the undersurface of the aluminum is avoided and a more efficient screen is obtained. Data to illustrate this is also provided.

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patent: 5723170 (1998-03-01), Kawase et al.
patent: 5843534 (1998-12-01), Chang et al.

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