Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...
Patent
1996-11-26
1998-05-05
Glass, Margaret W.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From silicon reactant having at least one...
528 38, 528 35, 556425, 556434, 525431, 525478, C08G 7726
Patent
active
057476250
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
The present invention relates to a polyimide resin, specifically to a polyimide resin having alkylsilicate on a polymer side chain.
BACKGROUND ART
Polyimide type resins are excellent in a heat resistance, electrical properties and mechanical properties and widely used for films, coating agents and molding materials. In recent years, polyimide resins have been investigated to apply to adhesive materials by making use of flexibility thereof (Japanese Patent Application Laid-Open No. Hei 3-177472). However, all of them are linear type thermoplastic polyimide resins and have had the defects that they have extremely low strengths at temperatures higher than the glass transition points and inferior solvent resistance. In order to improve this, it has been investigated to copolymerize a soft segment such as diaminosiloxane (Japanese Patent Application Laid-Open No. Hei 4-3632 and Japanese Patent Application Laid-Open No. Hei 5-112760). Further, a thermosetting type polyimide having a cross-linkable group at a terminal has been developed (Japanese Patent Application Laid-Open No. Hei 3-259980). However, they are an oligomer having a low molecular weight, so that they have had the defects that film formation is difficult and the use is restricted to varnish and that a high curing temperature is required.
DISCLOSURE OF THE INVENTION
The present invention provides a novel silicate group-containing polyimide which overcomes the preceding defects of conventional techniques and is excellent in mechanical properties, heat resistance and electrical properties and which has an excellent film forming ability. Further, the present invention provides a film-formable heat resistant material having an excellent solvent resistance, elasticity and adhesive property.
That is, the present invention relates to a silicate group-containing polyimide having a repeated unit represented by the following Formula (1): ##STR2## wherein Ar.sub.1 represents a tetravalent organic group; R.sub.1 and R.sub.2 each are a single bond or represent an alkylene group having 1 to 4 carbon atoms or a phenylene group; R.sub.3 to R.sub.7, R.sub.9 and R.sub.10 each represent a hydrocarbon group having 1 to 6 carbon atoms; R.sub.8 represents an ethylene group or an alkylene group having 3 to 6 carbon atoms; m and n represent independently an integer of 1 to 10; and k represents an integer of 0 to 2.
Further, the present invention relates to a silicate group-containing polyimide comprising 1 to 80 mole % of the repeated unit represented by Formula (1) and 20 to 99 mole % of a repeated unit represented by the following Formula (2): ##STR3## wherein Ar.sub.2 represents a tetravalent organic group, and Ar.sub.3 represents a divalent organic group having at least 3 aromatic rings.
The repeated unit represented by Formula (1) described above is composed of tetracarboxylic anhydride and diamine. In the formula, Ar.sub.1 is a tetravalent organic group constituting tetracarboxylic anhydride which is the raw material, and specific examples of such tetracarboxylic anhydride include tetracarboxylic dianhydride having at least two aromatic rings, such as 3,3',4,4'-diphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, 3,3',4,4'-diphenyl sulfone tetracarboxylic dianhydride, 2,2-bis(3,3',4,4'-tetracarboxyphenyl) hexafluoropropane dianhydride, 2,3,3',4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-benzophenonetetracarboxylic dianhydride, 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride, 2,3,3',4'-diphenyl sulfone tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenoxyphenyl) propane dianhydride and 2,2'-bis(3,4-dicarboxyphenoxyphenyl)sulfone dianhydride. There can be used as well, tetracarboxylic anhydrides such as pyromellitic anhydride, 1,4,5,8-naphthalenetetracarboxylic anhydride and 2,3,6,7-naphthalenetetracarboxylic anhydride.
Further, specific examples of the diamine component used in the present invention for constituting the repeated unit represente
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patent: 5473041 (1995-12-01), Itoh
Mat. Res. Soc. Symp. Proc., 175, 179-186 (1990).
Fujiyama Takeshi
Furukawa Nobuyuki
Yuasa Masatoshi
Glass Margaret W.
Nippon Steel Chemical Co. Ltd.
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