Hydrogen charged thin film conductor

Details Hydrogen charged thin film conductor Hydrogen charged thin film conductor

1983-03-21

1985-06-25

James, Andrew J.

357 65, 357 68, 357 78, H01L 2336, H01L 2348

Patent

active

045257345

ABSTRACT:
A thin film conductive stripe having increased resistance to electromigration wherein a conductive element is alloyed with at least one other hydrogen storage element capable of accepting and holding hydrogen internally within the thin film stripe and the stripe is annealed in a hydrogen atmosphere to react hydrogen with the storage material to charge the stripe with hydrogen.

REFERENCES:
patent: 3725309 (1973-04-01), Ames et al.
patent: 4017890 (1977-04-01), Howard et al.
patent: 4166279 (1979-08-01), Gangulee et al.
IBM Technical Disclosure Bulletin vol. 13 #6, "Aluminum Land Metallurgy With Copper on the Surface" by Daley et al., Nov. 1970.
Journal of Vacuum Science and Technology, vol. 17, 1980 "Effects of Hydrogen Incorporation in Some Deposited Metallic Thin Films" by Donald Meyer (pp. 322-326).
IBM TDB vol. 13, #5, p. 1124 Oct. 1970, "Titanium Overlay on Metallurgy" by Gnieweh.
IBM TDB vol. 21, #12 pp. 4837-4838, May 1979, "Electromigration Improvement . . . Conductors" by Howard.
IBM TDB vol. 20 #9 pp. 3477-3479, Feb. 78, "Fabrication of Intermettalic Diffusion Barriers for Electromigration . . . " by Howard.

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