Photomask

Details Photomask Photomask

1977-03-28

1981-02-03

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

29579, 156656, 428209, 428210, 428433, 428195, 430 11, 430 13, 430 16, G03C 500, G03C 1100

Patent

active

042489482

ABSTRACT:
A photomask comprising a substrate pervious to light having one or more transparent islands and one or more opaque islands formed on one surface thereof, the thickness of the transparent islands being greater than that of the opaque islands. When this photomask is used to pattern a photoresist, the gas evolved from the photoresist can be effectively led to the outside, so that the quality of contact between the semiconductor wafer and the photomask is improved.

REFERENCES:
patent: 3118788 (1964-01-01), Hensler
patent: 3753816 (1973-08-01), Feldstein et al.
patent: 3758326 (1973-09-01), Hennings et al.
patent: 3866310 (1975-02-01), Driver et al.
patent: 3926699 (1975-12-01), Dixon
patent: 3990982 (1976-11-01), Dixon
patent: 3991231 (1976-11-01), Trausch
patent: 4068018 (1978-01-01), Hashimoto et al.
patent: 4113486 (1978-09-01), Sato

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