Electric power conversion systems – Current conversion – Including d.c.-a.c.-d.c. converter
Patent
1995-05-05
1996-11-19
Wong, Peter
Electric power conversion systems
Current conversion
Including d.c.-a.c.-d.c. converter
363 89, 363 97, H02M 3335
Patent
active
055769390
ABSTRACT:
An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.
REFERENCES:
patent: 4103324 (1978-07-01), Vandervelden et al.
patent: 4181541 (1980-01-01), LeFrancois
patent: 4194930 (1980-03-01), Tanaka et al.
patent: 4711767 (1987-12-01), Diederich
patent: 4792730 (1988-12-01), Mintchev et al.
patent: 4931169 (1990-06-01), Scherer et al.
patent: 4936960 (1990-06-01), Siefkes et al.
patent: 4963238 (1990-10-01), Siefkes et al.
patent: 4981566 (1991-01-01), Wurczinger
patent: 5001620 (1991-03-01), Smith
patent: 5006213 (1991-04-01), Sichmann et al.
patent: 5009764 (1991-04-01), Siefkes et al.
patent: 5034973 (1991-07-01), Ishiyama
patent: 5074984 (1991-12-01), Sichmann et al.
patent: 5108571 (1992-04-01), Ludwig et al.
patent: 5126033 (1992-06-01), Szczyrbowski et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5286360 (1994-02-01), Szozrbowski
patent: 5300205 (1994-04-01), Fritsche
patent: 5357418 (1994-10-01), Clavel
Abstract, New Method of Arc Suppression for Reactive-DC-Magnetron Sputtering; Williams, et al., pp. 1-16, Sep. 1992.
New Method of Arc Suppression for Reactive-DC-Magnetron Sputtering; Williams, et al., pp. 1-16, possibly in 1992.
"Optical Society of America Annual Meeting", 1992 Technical Digest series, vol. 23, [Abstract].
Berhane Adolf
Santangelo Luke
Wong Peter
LandOfFree
Enhanced thin film DC plasma power supply does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Enhanced thin film DC plasma power supply, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Enhanced thin film DC plasma power supply will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-545557