Silica glass for photolithography

Details Silica glass for photolithography Silica glass for photolithography

1996-01-03

2000-07-11

Group, Karl

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

359350, C03C 306

Patent

active

060872837

ABSTRACT:
A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

REFERENCES:
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patent: 5349456 (1994-09-01), Iwanaga et al.
patent: 5364433 (1994-11-01), Nishimura et al.
patent: 5410428 (1995-04-01), Yamgata et al.
patent: 5668067 (1997-09-01), Araujo et al.
patent: 5679125 (1997-10-01), Hiraiwa et al.
patent: 5707908 (1998-01-01), Komine et al.

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