Photosensitive bis(halomethyloxadiazole) compound and photosensi

Details Photosensitive bis(halomethyloxadiazole) compound and photosensi Photosensitive bis(halomethyloxadiazole) compound and photosensi

1995-09-06

1996-11-19

Gerstl, Robert

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

4302701, 4302831, C07D41312

Patent

active

055764410

ABSTRACT:
Photosensitive bis (halomethyloxadiazole) compounds which are capable of producing free radicals upon exposure to light represented by the following general formulae (1) to (4): ##STR1## The symbols in the above formulae are defined in the present specification. The photosensitive bis(halomethyloxadiazole) compound is useful in the fields of recording materials such as photosensitive protecting films, printing plates, photoresists, proofs, etc. Furthermore, a photosensitive transfer sheet using a photosensitive composition containing the photosensitive bis(halomethyloxadiazole) is useful in making a prepress proof for color proofing, a color display, etc.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr et al.
patent: 5374642 (1994-12-01), Kardoff

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